Cincinnati Enquirer: Express yourself with fun, fashionable face masks
University of Cincinnati alumni design face masks with flair
As face masks become more prevalent in everyday life, they're also becoming more fashionable. The Cincinnati Enquirer spoke to two University of Cincinnati grads who are putting a stylish spin on the functional face covering.
Tessa Clark models her mask design.
Local designer Tessa Clark, a 2016 graduate of UC's College of Design, Architecture, Art, and Planning who competed on the TV series "Project Runway" and manages Cincinnati boutique Idlewild Woman, crafted a mask made from organic cotton and hemp jersey with cotton ribbons as ties that mashes with her elevated minimal fashion brand, Grind and Glaze.
Newly minted DAAP grad Anna Hayes has made more than 100 face masks for family and friends using fabric she already had on hand.
"...It's funny," Hayes told the Enquirer. "My mother calls me a fabric hoarder and is always asking when I’m going to use that stuff in the basement. The answer is 'now.'"
Featured image at top: Fabric face masks can offer protection and act as a fashion accessory.Photo/Vera Davidova on Unsplash
Related Stories
Rain, steep slopes put NY community at risk of landslides, geologist warns
April 23, 2026
UC Associate Professor Dan Sturmer tells News10 that heavy rain combined with steep slopes is a recipe for landslides in one New York community.
UC expands partnership with Thales for AI research
April 22, 2026
The University of Cincinnati’s interdisciplinary research facility Digital Futures welcomed its first industrial partner, Thales, at the beginning of Research + Innovation week. Thales is a global aerospace, defense and digital technology firm. Headquartered in France, it employs 83,000 people in dozens of countries, according to the Business Courier.
BearcatGPT: UC becomes first Ohio university to offer AI platform
April 22, 2026
Local news media highlight UC's private AI platform, BearcatGPT, that offers a suite of tools for students, faculty and staff.